Investigation of Self-Assembled Monolayer Resists for Hafnium Dioxide Atomic Layer Deposition

By Rong Chen, Hyoungsub Kim, Paul C. McIntyre, S. Bent. 2005

155 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/dc3df93e7c145f0dd1bb9219586d1233af24db18