Reactive sputter deposition of TiN layers: modelling the growth by characterization of particle fluxes towards the substrate

By S. Mahieu, D. Depla. 2009

170 citations recorded by the source corpus.

Subfields: Condensed Matter Physics, Electronic, Optical and Magnetic Materials, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/db5194c419fc198f379fb7573fa23529d8421192

How researchers see this paper

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In Condensed Matter Physics

1. P. Patsalas
2. N. Kalfagiannis
3. S. Kassavetis

In Electronic, Optical and Magnetic Materials

1. P. Patsalas
2. N. Kalfagiannis
3. S. Kassavetis

In Mechanics of Materials

1. N. Kalfagiannis
2. S. Kassavetis
3. P. Patsalas

Citations in the corpus

• Optical Properties and Plasmonic Performance of Titanium Nitride (2015, methodology): “A wide variety of fabrication techniques have been used for the growth of B1-TiN films, such as Magnetron Sputtering (MS) [83–90], Cathodic Vacuum Arc (CVA) [91–93], Chemical Vapor Deposition (CVD) [94,95], Atomic Layer Deposition (ALD) [96,97], Pulsed Laser Deposition [15,16,98,99], Ion Beam Assist”