$\hbox{HfO}_{x}/\hbox{TiO}_{x}/\hbox{HfO}_{x}/ \hbox{TiO}_{x}$ Multilayer-Based Forming-Free RRAM Devices With Excellent Uniformity

By Z. Fang, H. Y. Yu, Xiang Li, Navab Singh, Guo-Qiang Lo, D. Kwong. IEEE Electron Device Letters, 2011

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