Thermodynamic stability of high-K dielectric metal oxides ZrO2 and HfO2 in contact with Si and SiO2

By M. Gutowski, J. Jaffe, Chun-Li Liu, M. Stoker, R. Hegde, R. Rai, P. Tobin. 2002

368 citations recorded by the source corpus.

Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials

View Paper: https://www.semanticscholar.org/paper/d4d766fe56e77f93f7dd9963577d5f22029392c9