Conformal Al2O3 dielectric layer deposited by atomic layer deposition for graphene-based nanoelectronics

By Bongki Lee, Seongyong Park, Hyunchul Kim, Kyeongjae Cho, E. Vogel, Moon J. Kim, Robert M. Wallace, Jiyoung Kim. 2008

268 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/d451ed6548c8b967a47f3756d86e2f938181389c