A comparative study of the UV optical and structural properties of SiO2, Al2O3, and HfO2 single layers deposited by reactive evaporation, ion-assisted deposition and plasma ion-assisted deposition

By R. Thielsch, A. Gatto, J. Heber, N. Kaiser. 2002

154 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Mechanics of Materials, Surfaces, Coatings and Films

View Paper: https://www.semanticscholar.org/paper/d0c614f499badb36c463b2e55ca391b55fe06603