Nanowire Arrays Defined by Nanoimprint Lithography

By T. Mårtensson, P. Carlberg, Magnus Borgström, L. Montelius, W. Seifert, Lars Samuelson. 2004

394 citations recorded by the source corpus.

Subfields: Biomedical Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/cd808156ce1933ec808efec7608bd226d8224830

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Biomedical Engineering

1. Magnus Borgström
2. J. Wallentin
3. Zhiyong Fan
4. Lars-Erik Wernersson
5. Tomas Bryllert
6. Lars Samuelson
7. J. Lu
8. P. Kuyanov

In Materials Chemistry

1. J. Wallentin
2. Zhiyong Fan
3. Magnus Borgström
4. J. Lu
5. Lars Samuelson
6. P. Kuyanov
7. Pai-chun Chang

Citations in the corpus

• III–V nanowire photovoltaics: Review of design for high efficiency (2013, background): “Patterned growth can be achieved by standard lithography procedures, such as electron beam lithography (EBL) [18] or nanoimprint lithography (NIL) [19] to produce an Au dot array.”
• Quasi-one-dimensional metal oxide materials—Synthesis, properties and applications (2006, methodology): “Lithography and nanoimprint [69] techniques have been widely used to achieve this objective.”
• Doping of semiconductor nanowires (2011, methodology): “B: Gold seed particles are deposited, using nanoimprint lithography [67], electron beam lithography (EBL), or aerosol deposition [68, 69].”