Rutile-type TiO2 thin film for high-k gate insulator

By M. Kadoshima, M. Hiratani, Y. Shimamoto, K. Torii, H. Miki, S. Kimura, T. Nabatame. 2003

222 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/c70a951d413f0e3103191999e92040c78eabb0e5