Atomic Layer Deposition of Ultrathin Copper Metal Films from a Liquid Copper(I) Amidinate Precursor

By Zhengwen Li, A. Rahtu, R. Gordon. 2006

203 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials

View Paper: https://www.semanticscholar.org/paper/bee53445ff7b0b4eaed94aa771ce4890434b790e

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Electrical and Electronic Engineering

1. J. Steinke
2. Shlomo Magdassi
3. A. Kamyshny

In Electronic, Optical and Magnetic Materials

1. J. Steinke
2. Shlomo Magdassi
3. A. Kamyshny

Citations in the corpus

• Metal-based Inkjet Inks for Printed Electronics (2011, background): “9 μ cm for 80 nm thick film, that is 20% higher compared to Cu films obtained by PVD [161].”