On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films

By M. I. Alayo, I. Pereyra, W. Scopel, M. Fantini. 2002

145 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/bd0959e875d1d3fbb7da7812e812def4d0d88546