Densely Packed Arrays of Ultra‐High‐Aspect‐Ratio Silicon Nanowires Fabricated using Block‐Copolymer Lithography and Metal‐Assisted Etching

By Shih‐wei Chang, V. Chuang, S. Boles, Caroline A. Ross, Carl V. Thompson. 2009

208 citations recorded by the source corpus.

Subfields: Biomedical Engineering, Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/bb0c37db4fc31ab9398fc50ee5e95f3cba3d0523

Citations in the corpus

• Metal assisted chemical etching for high aspect ratio nanostructures: A review of characteristics and applications in photovoltaics (2012, unknown): “Densely packed Si nanowire array, with sub-10 nm diameters and aspect ratio as high as 220, has also been demonstrated [38,39].”