Low-power microwave plasma source based on a microstrip split-ring resonator
By Felipe Iza, J. Hopwood. 2003
144 citations recorded by the source corpus.
Microplasma sources can be integrated into portable devices for applications such as bio-microelectromechanical system sterilization, small-scale materials processing, and microchemical analysis systems. Portable operation, however, limits the amount of power and vacuum levels that can be employed in the plasma source. This paper describes the design and initial characterization of a low-power microwave plasma source based on a microstrip split-ring resonator that is capable of operating at pressures from 0.05 torr (6.7 Pa) up to one atmosphere. The plasma source's microstrip resonator operates at 900 MHz and presents a quality factor of Q=335. Argon and air discharges can be self-started with less than 3 W in a relatively wide pressure range. An ion density of 1.3/spl times/10/sup 11/ cm/sup -3/ in argon at 400 mtorr (53.3 Pa) can be created using only 0.5 W. Atmospheric discharges can be sustained with 0.5 W in argon. This low power allows for portable air-cooled operation. Continuous operation at atmospheric pressure for 24 h in argon at 1 W shows no measurable damage to the source.
Subfields: Aerospace Engineering, Electrical and Electronic Engineering, Radiology, Nuclear Medicine and Imaging
View Paper: https://www.semanticscholar.org/paper/b802cf269c717262da8f10576a6400535478a5a6
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Citations in the corpus
- Microplasmas and applications (2006, background): “…several laboratories (Bass et al 2001, Yoshiki and Horiike 2000, Iza and Hopwood 2003, Ostrom et al 2004, Teranishi et al 2004) and have been explored as a means of generating stable plasmas in air at atmospheric pressure (Iza and Hopwood 2003, Guo and Hong 2003, Yalin et al 2003, Yu et al 2003).”
- Microwave-excited atmospheric-pressure microplasmas based on a coaxial transmission line resonator (2009, unknown): “This observation agrees with those made using an argon plasma sustained by a microstrip split-ring resonator [8, 26].”
- Split-ring resonator microplasma: microwave model, plasma impedance and power efficiency (2005, methodology): “The increase in the plasma resistance, despite the increase in electron density, is due to the higher electron–neutral collisional frequency and the constriction of the discharge from a diffuse discharge into a filamentary one (figure 6 in [15]).”