Thermal stability of sputtered Al2O3 coatings

By V. Edlmayr, M. Moser, C. Walter, C. Mitterer. 2010

153 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/b6a14cc6575af48a5e4b5d6f7afff7194d904ce7

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Materials Chemistry

1. Hanzhu Zhang
2. Farid Akhtar
3. S. Alvi

In Mechanics of Materials

1. Hanzhu Zhang
2. Farid Akhtar
3. S. Alvi

Citations in the corpus

• Pulsed laser deposited alumina thin films (2016, background): “Various deposition techniques such as magnetron sputtering [1, 3, 4, 6, 8, 12-19], electron beam evaporation [20-22], and pulsed laser deposition (PLD) [7, 23-25] can be used for the preparation of both crystalline and amorphous alumina thin films.”
• High-Entropy Ceramics (2019, background): “The reported hardness values of HEO coatings were relatively higher than most of the reported oxide films, such as Al2O3 (10 GPa) [60], TiO2 (18 GPa) [61], V2O5 (3–7 GPa) [62], and ZrO2 (15 GPa) [63].”