Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition

By Jeffrey W. Elam, M. Groner, S. George. 2002

512 citations recorded by the source corpus.

Subfields: Biomedical Engineering, Computational Mechanics, Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/b5424180ec7e20fedcf0cee082b4cdf601396011

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Biomedical Engineering

1. Xiaohua Du
2. S. George
3. Ken Gall

In Computational Mechanics

1. Xiaohua Du
2. S. George

In Electrical and Electronic Engineering

1. Xiaohua Du
2. S. George

Citations in the corpus

• Thickness dependence of sensor response for CO gas sensing by tin oxide films grown using atomic layer deposition (2008, methodology): “During the growth of these SnOx ALD films on the hotplate templates at 250 ◦C, the thickness of each SnOx ALD film was monitored by a QCM in the reactor [34, 43 ].”