Plasma enhanced chemical vapor deposition of amorphous, polymorphous and microcrystalline silicon films

By P. Cabarrocas. 2000

182 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/aff4fe0e7d4f8b5392a67d7cb657e7147a12171e

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In Electrical and Electronic Engineering

1. O. Ishihara

In Materials Chemistry

1. O. Ishihara

Citations in the corpus

• Complex plasma: dusts in plasma (2007, background): “The detailed laboratory experiments have revealed the fundamental process of the nucleation and agglomeration of dust particles or powder [51–53].”