Composition, nanostructure and origin of the ultrahardness in nc-TiN/a-Si3N4/a- and nc-TiSi2 nanocomposites with HV= 80 to ≥ 105 GPa

By S. Vepřek, A. Niederhofer, K. Moto, T. Bolom, H.-D. Männling, P. Nesládek, G. Dollinger, A. Bergmaier. 2000

393 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/af725e15cba18fe4b28af6a406600e47643484e7

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In Materials Chemistry

1. Wei Li
2. P. K. Liaw
3. P. Paufler
4. N. Mukhopadhyay
5. Ping Liu

In Mechanics of Materials

1. Wei Li
2. P. K. Liaw
3. P. Paufler
4. N. Mukhopadhyay
5. Ping Liu

Citations in the corpus

• Microstructures and properties of high-entropy alloy films and coatings: a review (2018, positive): “The TiSiN (TiN/Si 3 N 4 ) is a representative film among these films due to the strong thermodynamic incompatibility between TiN and Si 3 N 4 , which exhibits high hardness ranging from 32 to 105 GPa deposited by different methods [170–172].”
• Micro- and nanoindentation techniques for mechanical characterisation of materials (2006, methodology): “Recently, Veprek et al. (2000) developed multiphase nanocomposite coatings (3–20 mm thick) consisting of nanocrystalline TiN, amorphous Si3Ni4 and amorphous and nanocrystalline TiSi2, nc-TiN/a-SiNx/a- and ncTiSi2 on steel substrate by the chemical vapour deposition (CVD) technique.”