The pristine atomic structure of MoS2 monolayer protected from electron radiation damage by graphene

By G. Algara-Siller, S. Kurasch, M. Sedighi, O. Lehtinen, U. Kaiser. 2013

159 citations recorded by the source corpus.

Materials can, in principle, be imaged at the level of individual atoms with aberration-corrected transmission electron microscopy. However, such resolution can be attained only with very high electron doses. Consequently, radiation damage is often the limiting factor when characterizing sensitive materials. Here, we demonstrate a simple and an effective method to increase the electron radiation tolerance of materials by using graphene as protective coating. This leads to an improvement of three orders of magnitude in the radiation tolerance of monolayer MoS2. Further on, we construct samples in different heterostructure configurations to separate the contributions of different radiation damage mechanisms.

Subfields: Electronic, Optical and Magnetic Materials, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/ab83372cf329a2d8d56bc00cd6421b74bc6a9588

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In Electronic, Optical and Magnetic Materials

In Materials Chemistry

Citations in the corpus

Graphene versus MoS2: A short review (2014, background): “As graphene and SLMoS2 have complementary physical properties, it is natural to combine graphene and SLMoS2 in specific ways to create heterostructures that mitigate any negative properties [25, 26, 187–197].”
Production and processing of graphene and related materials (2020, methodology): “The following techniques provide good results: the production of clean surfaces [1485], sandwiching the radiation-sensitive material between two SLGs [1486], and isotope substitution [1487].”