In situ etching for total control over axial and radial nanowire growth

By Magnus Borgström, J. Wallentin, J. Trägårdh, P. Ramvall, M. Ek, L. Wallenberg, Lars Samuelson, K. Deppert. 2010

156 citations recorded by the source corpus.

AbstractWe report a method using in situ etching to decouple the axial from the radial nanowire growth pathway, independent of other growth parameters. Thereby a wide range of growth parameters can be explored to improve the nanowire properties without concern of tapering or excess structural defects formed during radial growth. We demonstrate the method using etching by HCl during InP nanowire growth. The improved crystal quality of etched nanowires is indicated by strongly enhanced photoluminescence as compared to reference nanowires obtained without etching.

Subfields: Biomedical Engineering, Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/ab23ebfa065f7edd84ee174c1af23395eaf04c6b

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In Biomedical Engineering

  1. Magnus Borgström
  2. J. Wallentin
  3. J. Johansson
  4. J. Bolinsson
  5. Lars Samuelson
  6. P. Caroff
  7. K. Deppert
  8. P. Wickert

In Electrical and Electronic Engineering

  1. Magnus Borgström
  2. J. Wallentin
  3. Lars Samuelson
  4. J. Johansson
  5. K. Deppert
  6. P. Caroff
  7. J. Bolinsson
  8. P. Wickert

In Materials Chemistry

  1. Magnus Borgström
  2. J. Wallentin
  3. J. Johansson
  4. J. Bolinsson
  5. P. Caroff
  6. Lars Samuelson
  7. P. Wickert
  8. P. Kuyanov

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