Comparison between SiOC Thin Film by plasma enhance chemical vapor deposition and SiO 2 Thin Film by Fourier Transform Infrared Spectroscopy

By T. Oh, C. Choi. 2010

201 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/aa45a94e1ddf0f7756d1fce9d8412fdc9919b1df