Effect of gate oxidation method on electrical properties of metal-oxide-semiconductor field-effect transistors fabricated on 4H-SiC C(0001) face
By K. Fukuda, Makoto Kato, K. Kojima, J. Senzaki. 2004
144 citations recorded by the source corpus.
Subfields: Electrical and Electronic Engineering
View Paper: https://www.semanticscholar.org/paper/a97d65d00c8c70563e5cd3636c3fa13ac3b36ff8