Low-energy plasma-enhanced chemical vapor deposition for strained Si and Ge heterostructures and devices

By G. Isella, Daniel Chrastina, B. Rössner, T. Hackbarth, H. Herzog, U. Konig, H. Känel. 2004

151 citations recorded by the source corpus.

Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/a8da91fa2ae0b9770fbfbf4b973fd52527cb19b8