Implementation of the projector augmented-wave LDA+U method: Application to the electronic structure of NiO

By O. Bengone, M. Alouani, P. Blöchl, J. Hugel. 2000

441 citations recorded by the source corpus.

The so-called local-density approximation (LDA) plus the multiorbital mean-field Hubbard model (LDA+U) has been implemented within the all-electron projector augmented-wave method, and then used to compute the insulating antiferromagnetic ground state of NiO and its optical properties. The electronic and optical properties have been investigated as a function of the Coulomb repulsion parameter U. We find that the value obtained from constrained LDA $(U=8$ eV) is not the best possible choice, whereas an intermediate value $(U=5$ eV) reproduces the experimental magnetic moment and optical properties satisfactorily. At intermediate U, the nature of the band gap is a mixture of charge transfer and Mott-Hubbard type, and becomes almost purely of the charge-transfer type at higher values of U. This is due to the enhancement of the oxygen $2p$ states near the top of the valence states with increasing U value.

Subfields: Electronic, Optical and Magnetic Materials, Materials Chemistry, Polymers and Plastics

View Paper: https://www.semanticscholar.org/paper/a7930e5e3f2396632d99f8149271b9e45152af95

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Electronic, Optical and Magnetic Materials

  1. Johannes Schimpl
  2. C. J. Först
  3. Á. Gali
  4. G. Thiering

In Materials Chemistry

  1. Á. Gali
  2. Johannes Schimpl
  3. C. J. Först
  4. G. Thiering
  5. Iurii Timrov

Citations in the corpus