SiO2 Atomic Layer Deposition Using Tris(dimethylamino)silane and Hydrogen Peroxide Studied by in Situ Transmission FTIR Spectroscopy

By B. B. Burton, S. W. Kang, S. Rhee, S. George. 2009

158 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/a22fe8437cd177095de0fb96dded5a95dddc8bb3