Fabrication of large area subwavelength antireflection structures on Si using trilayer resist nanoimprint lithography and liftoff

By Zhaoning Yu, H. Gao, Wei Wu, Haixiong Ge, Stephen Y. Chou. 2003

230 citations recorded by the source corpus.

Subfields: Biomedical Engineering, Electrical and Electronic Engineering, Surfaces, Coatings and Films

View Paper: https://www.semanticscholar.org/paper/a14050c44c6c182cacb3805f7ebb57376bbf7555

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In Biomedical Engineering

1. C. Pan

Citations in the corpus

• Improved broadband and quasi-omnidirectional anti-reflection properties with biomimetic silicon nanostructures. (2007, background): “, producing porous surfaces that can be rather fragile, and other approaches involve lithography, which is often either too expensive or unsuitable for making sub-wavelength structures with high aspect ratios over large area”