Pulsed laser deposition of thin films : applications-led growth of functional materials
By R. Eason. 2006
826 citations recorded by the source corpus.
Subfields: Computational Mechanics, Electrical and Electronic Engineering
View Paper: https://www.semanticscholar.org/paper/09814de6bbeacbb5765234257fe0e0552bca7577
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In Electrical and Electronic Engineering
Citations in the corpus
- Pulsed laser deposited alumina thin films (2016, background): “01 mbar), interaction between the ablation plume and the gas creates scattering and broadening of the angular distribution of the plume and a reduction of the ablated particles density deposited on a substrate located in front of the target can be expected [28].”
- Wear resistance investigation of titanium nitride-based coatings (2015, background): “Then, the ablated material is ejected from the target in a high, forward-directed plasma plume, resulting in a flux that leads to film growth [61].”
- Advances in the growth and characterization of magnetic, ferroelectric, and multiferroic oxide thin films (2010, background): “The reader is directed to a number of excellent books and thorough reviews on the history and evolution of this process [12–14].”