Organosilane self‐assembled monolayers formed at the vapour/solid interface

By H. Sugimura, A. Hozumi, T. Kameyama, O. Takai. 2002

150 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Surfaces, Coatings and Films

View Paper: https://www.semanticscholar.org/paper/9e992f4adbfe0d9fc3e97252d0467dac6b70c323

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Electrical and Electronic Engineering

1. Abdul Latif Ahmad
2. Hussam Jouhara
3. Wan Azzura Wan Ramli
4. Choe Peng Leo
5. N. A. Ahmad

In Surfaces, Coatings and Films

1. Hussam Jouhara
2. Jeremey A Miller
3. Inge van den Boogaert
4. Darem Ahmad
5. R. Presswell

Citations in the corpus

• Hydrophilic and hydrophobic materials and their applications (2018, methodology): “Chlorosilanes have been used on silicon oxide (Fadeev and McCarthy 1999; Goodwin, Harbron, and Reynolds 1990; Sagiv 1980; Sugimura et al. 2002), aluminum (Kallury et al. 1992; Kurth and Bein 1992), and titanium (Fadeev, Helmy, and Marcinko 2002).”
• Membranes with Great Hydrophobicity: A Review on Preparation and Characterization (2015, background): “FAS generates the highest water contact angle since it consists of hydrophobic groups; Si–C, C– C, C–O, –CF2–CH2–, CF2–CF2– and CF2–CF3 (118).”