Island growth in the atomic layer deposition of zirconium oxide and aluminum oxide on hydrogen-terminated silicon: Growth mode modeling and transmission electron microscopy

By Riikka L. Puurunen, W. Vandervorst, W. Besling, O. Richard, H. Bender, T. Conard, Chao Zhao, A. Delabie, M. Caymax, Stefan De Gendt and 10 more. 2004

143 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/9ce87ba6a9be1d176e1fce14f0ee13cf2863ad9e