Preferential Growth of Semiconducting Single-Walled Carbon Nanotubes by a Plasma Enhanced CVD Method
By Yiming Li, D. Mann, M. Rolandi, Woong Kim, A. Ural, S. Hung, Ali Javey, Jie Cao, Dunwei Wang, E. Yenilmez and 4 more. 2004
496 citations recorded by the source corpus.
Subfields: Materials Chemistry
View Paper: https://www.semanticscholar.org/paper/9ade12fd0c7fbb37d81213292b17bd323b1a62f1
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In Materials Chemistry
Citations in the corpus
- An Overview of the Recent Progress in the Synthesis and Applications of Carbon Nanotubes (2019, methodology): “This method can be further classified into various types, including CCVD (catalytic chemical vapor deposition) [32], PE‐CVD (plasma‐enhanced chemical vapor deposition) [33], microwave plasma (MPECVD) [34] and oxygen‐ assisted CVD.”
- Progress towards monodisperse single-walled carbon nanotubes. (2008, background): “Isolated examples of enriched semiconductor SWNT growth via plasma enhanced chemical vapour depositio”
- Circuit-Level Performance Benchmarking and Scalability Analysis of Carbon Nanotube Transistor Circuits (2009, background): “Current CNT synthesis techniques grow 10% to 70% metallic CNTs [21].”
- On Coating Techniques for Surface Protection: A Review (2019, unknown): “These second-hand categories often include aerosol-assisted CVD, direct liquid injection CVD, plasma-enhanced CVD, microwave-plasma-assisted CVD, hybrid physical-chemical CVD, and photo-assisted CVD [28,29].”