Recent developments in micromilling using focused ion beam technology
By Ampere A. Tseng. 2004
413 citations recorded by the source corpus.
Subfields: Atomic and Molecular Physics, and Optics, Biomedical Engineering, Electrical and Electronic Engineering
View Paper: https://www.semanticscholar.org/paper/916f29ec653ce43af9826c4253a6644eafc8d996
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In Atomic and Molecular Physics, and Optics
In Biomedical Engineering
In Electrical and Electronic Engineering
Citations in the corpus
- Surface Texture Manufacturing Techniques and Tribological Effect of Surface Texturing on Cutting Tool Performance: A Review (2016, neutral): “FIB milling is the process of transferring patterns by direct impingement of the ion beam on the substrate material.(128) FIB can be used for local extraction or deposition with a resolution of 100 nm.”
- Review on Micro- and Nanolithography Techniques and Their Applications (2012, background): “On the other hand, maskless lithography, such as electron beam lithography [22-29], focused ion beam lithography [30-33], and scanning probe lithography [34-44], fabricates arbitrary patterns by a serial writing without the use of masks.”