Chemical vapour deposition of coatings

By K. Choy. 2003

1,480 citations recorded by the source corpus.

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Metal Oxide Semi-Conductor Gas Sensors in Environmental Monitoring (2010, neutral): “Choy [29] observes that AACVD is a useful technique when forming oxides and the aerosol is readily surrounded by oxygen, for larger scale applications, it could be favoured as it is a relatively low-cost technique.”
Review of material design and reactor engineering on TiO2 photocatalysis for CO2 reduction (2015, methodology): “Table 3 highlights the advantages and disadvantages of different methods used for immobilising TiO2 catalysts [245–247].”
Membranes with Great Hydrophobicity: A Review on Preparation and Characterization (2015, methodology): “This atomistic deposition method can provide highly pure materials with structural control at atomic or nanometer scale level (126).”
Nanoporous anodic aluminium oxide: Advances in surface engineering and emerging applications (2013, neutral): “on a substrate [238].”
Multiple material additive manufacturing – Part 1: a review (2013, background): “Furthermore, when using multi-source precursors it is difficult to control the deposition of multicomponent materials because different precursors have different vaporisation rates, and most precursor gases are toxic, corrosive, flammable and/or explosive (Choy 2003).”