Plasma-polymer interactions: A review of progress in understanding polymer resist mask durability during plasma etching for nanoscale fabrication

By G. Oehrlein, R. Phaneuf, David B. Graves. 2011

195 citations recorded by the source corpus.

Subfields: Computational Mechanics, Electrical and Electronic Engineering, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/8e976a2419c297d2ab6f1399fef28742799c5c8d

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In Computational Mechanics

1. H. Funsten

Citations in the corpus

• Helium, Oxygen, Proton, and Electron (HOPE) Mass Spectrometer for the Radiation Belt Storm Probes Mission (2013, background): “Reactive ions such as O+ can rapidly etch hydrocarbons, at a much higher rate than physical sputtering by inert ions, by forming volatiles such as CO and CO2 (Oehrlein et al. 2011); we similarly expect enhanced etch rates of carbon foils from low energy O+.”