Surface chemistry and film growth during TiN atomic layer deposition using TDMAT and NH3

By Jeffrey W. Elam, M. Schuisky, J. Ferguson, S. George. 2003

149 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/8bd0d6506503f6f5e50ac5b40bf998a820195e0a