Oxidation Rate Effect on the Direction of Metal-Assisted Chemical and Electrochemical Etching of Silicon
By Zhipeng Huang, Tomohiro Shimizu, S. Senz, Zhang Zhang, N. Geyer, U. Gösele. 2010
147 citations recorded by the source corpus.
Subfields: Biomedical Engineering, Electrical and Electronic Engineering, Materials Chemistry
View Paper: https://www.semanticscholar.org/paper/8b79faedc1d6855594cc4274451a9fdcd544b5d3
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In Biomedical Engineering
In Electrical and Electronic Engineering
In Materials Chemistry
Citations in the corpus
- Metal assisted chemical etching for high aspect ratio nanostructures: A review of characteristics and applications in photovoltaics (2012, background): “Several groups systematically studied the effect of etchant concentration on etching direction as well as morphology using (1 0 0), (1 1 0), and (1 1 1) Si substrates [14,40,29].”