Atomic layer deposition of TiO2 from tetrakis-dimethyl-amido titanium or Ti isopropoxide precursors and H2O

By Qi Xie, Yulong Jiang, C. Detavernier, D. Deduytsche, R. Meirhaeghe, G. Ru, Bingzong Li, X. Qu. 2007

224 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/8994beb450b77535cc55b082685a73ab93c553d5