Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling

By I. Fomenkov, D. Brandt, A. Ershov, A. Schafgans, Y. Tao, G. Vaschenko, S. Rokitski, M. Kats, M. Vargas, M. Purvis and 11 more. 2017

134 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Radiation

View Paper: https://www.semanticscholar.org/paper/87f5bbfc57e5194e4abe8b820cb20082ae84e89d