Immersion lithography and its impact on semiconductor manufacturing

By B. Lin. SPIE Advanced Lithography, 2004

134 citations recorded by the source corpus.

View Paper: https://www.semanticscholar.org/paper/81db4180d96ec9660825c4209597b8d2c0d86880

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1. Yu-Chih Tseng
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Citations in the corpus

• Block Copolymer Nanostructures for Technology (2010, methodology): “Instead, working with an illumination wavelength of 193 nm, lithography engineers in the semiconductor industry employ sophisticated techniques, such as phase-shifting masks [29], immersion lithography [30,31], and increasingly,”