Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate)

By W. Hu, K. Sarveswaran, M. Lieberman, Gary H. Bernstein. 2004

236 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/814d41f064623970525bc35436f2cd22f9354034