Investigations of surface reactions during C2F6 plasma etching of SiO2 with equipment and feature scale models

By D. Zhang, Mark J. Kushner. 2001

159 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/806ed2b036e04c7cb8c460f69c82b774c6f40b88