Optical and structural investigation of ZnO thin films prepared by chemical vapor deposition (CVD)
By M. Purica, E. Budianu, E. Rusu, M. Danila, R. Gavrila. 2002
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Transparent and conductive ZnO thin films have been prepared by a method derived from chemical vapor deposition using Zn (C5H7O2)2 as Zn source. The deposited thin ZnO layers of ∼0.1 μm thickness on Si and InP semiconductor substrates, have been investigated with respect to the crystalline phase by X-ray diffraction (XRD), and surface morphology by atomic force microscopy (AFM). Spectrophotometric measurements in the ultraviolet-visible-near infrared spectral range and optoelectrical measurements of ZnO/semiconductor heterostructures have been performed.
Subfields: Electrical and Electronic Engineering, Materials Chemistry
View Paper: https://www.semanticscholar.org/paper/800a14f24bc10aded207f65b273d10f4d5bbeaf6
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In Materials Chemistry
Citations in the corpus
- Zinc oxide films prepared by sol–gel spin coating technique (2011, background): “ial, low cost and quantum size effect [1–4].”