Electrical and Interfacial Characterization of Atomic Layer Deposited High- $\kappa$ Gate Dielectrics on GaAs for Advanced CMOS Devices

By G. Dalapati, Y. Tong, W. Loh, Hoe Keat Mun, B. Cho. IEEE Transactions on Electron Devices, 2007

143 citations recorded by the source corpus.

Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/7fe9bc93950874c1afbd901a80effd80c267ef5d