Micro‐Nanostructured Interfaces Fabricated by the Use of Inorganic Block Copolymer Micellar Monolayers as Negative Resist for Electron‐Beam Lithography

By R. Glass, M. Arnold, J. Blümmel, A. Küller, M. Möller, Joachim Pius Spatz. 2003

144 citations recorded by the source corpus.

Subfields: Materials Chemistry, Surfaces, Coatings and Films

View Paper: https://www.semanticscholar.org/paper/7adcdf17061d68fe6ed5496426d93761e1d277ff