Thickness dependence of electrical properties of ITO film deposited on a plastic substrate by RF magnetron sputtering
By Dong-Ho Kim, M. Park, Hak-Jun Lee, Gun-hwan Lee. 2006
138 citations recorded by the source corpus.
Subfields: Electrical and Electronic Engineering, Materials Chemistry
View Paper: https://www.semanticscholar.org/paper/7a6498cf6cc8efddef09b6a944e50cfe25725e3a
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In Electrical and Electronic Engineering
In Materials Chemistry
- Claes-Goran Granqvist
- Alexandra Boltasseva
- Irene A. Goldthorpe
- B. P. Jelle
- Thomas Mason
- K. Poeppelmeier
- Alex Dolgonos
Citations in the corpus
- Oxides and nitrides as alternative plasmonic materials in the optical range (2011, background): “The losses also depend on the thickness because scattering is dependent on the microstructure of the film and the microstructure is thickness dependent [18, 19].”
- Silver nanowire transparent electrodes for liquid crystal-based smart windows (2015, background): “60 m(2) (assuming a required ITO film thickness of 100 nm [33,34] which would require 0.”
- Transparent conductors as solar energy materials: A panoramic review (2007, result): “GZO films on PEN yielded r 5 10 (4)O cm [361], and similar results have been reported for ITO on PC [362–365], poly-methyl methacrylate [366] and polyethersulfone [367], IZO on PET and PC [368], and for In2O3–ZnO–SnO2 on PET [369].”