The Parameter Space of Graphene Chemical Vapor Deposition on Polycrystalline Cu

By P. Kidambi, C. Ducati, B. Dlubak, D. Gardiner, R. Weatherup, Marie‐Blandine Martin, P. Seneor, Harry J. Coles, S. Hofmann. 2012

172 citations recorded by the source corpus.

Subfields: Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/77833157dff961b409ed445f7947bcf9f812c4c6

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In Materials Chemistry

1. S. Dai
2. S. Smirnov
3. I. Vlassiouk
4. P. Fulvio
5. Panos Datskos

Citations in the corpus

• Graphene Nucleation Density on Copper: Fundamental Role of Background Pressure (2013, background): “Finally, from the technological perspective, APCVD emerges as a more convenient choice for mass production of high quality graphene as compared to LPCVD because it requires less equipment and in which evaporation of copper in the reactor [41,42] is practically eliminated.”