Dense Self‐Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers
By Joy Y. Cheng, C. Rettner, D. Sanders, Ho-Cheol Kim, W. Hinsberg. 2008
307 citations recorded by the source corpus.
Subfields: Biomedical Engineering, Materials Chemistry, Organic Chemistry
View Paper: https://www.semanticscholar.org/paper/7736a1e72ebf6d9dee8ab4a0d16d6ee456c9969b
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In Biomedical Engineering
In Materials Chemistry
In Organic Chemistry
Citations in the corpus
- Bit-Patterned Magnetic Recording: Theory, Media Fabrication, and Recording Performance (2015, background): “DSA typically provides a factor of 2 (or more) in pitch division, followed by self-aligned double patterning (SADP) for a further 2X reduction to sub-20 nm pitch (which is needed in the downtrack direction, but optional for the cross-track direction).”
- Block Copolymer Nanostructures for Technology (2010, methodology): “Reprinted with permission from Reference [35].”