Template-assisted selective epitaxy of III–V nanoscale devices for co-planar heterogeneous integration with Si

By H. Schmid, M. Borg, K. Moselund, L. Gignac, C. Breslin, J. Bruley, D. Cutaia, Heike E. Riel. 2015

214 citations recorded by the source corpus.

Subfields: Biomedical Engineering, Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/74146649ad1a1426bb3a4bb97279501b415ec2b9

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Citations in the corpus

• How to control defect formation in monolithic III/V hetero-epitaxy on (100) Si? A critical review on current approaches (2018, methodology): “Figure 12(b) holds a simplified drawing of TASE as described in [178].”