Interface Tailoring of Heterogeneous Catalysts by Atomic Layer Deposition

By Bin Zhang, Yong Qin. ACS Catalysis, 2018

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The tailoring of the metal–oxide interface is an important strategy in the design and development of novel catalysts with superior catalytic performance. However, the structure and location of the metal–oxide interface on supported catalysts cannot be well controlled by traditional methods, and the structure–property relation is not clearly understood in most reactions. Therefore, it is highly desirable to develop new methods to precisely tailor the metal–oxide interface and thus achieve highly efficient catalysts and a fundamental understanding of the principle of interface catalysis. Atomic layer deposition (ALD), a high-level film-growth technology, is a promising and controllable approach to precisely design and tailor the metal–oxide interface on an atomic scale. In this Review, we present and discuss a series of recently developed ALD strategies for tailoring the metal–oxide interface of heterogeneous catalysts, such as overcoating, ultrathin modification, area-selective ALD, template-assisted ALD, ...

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/73df536f0167226ef2511aedd57031093b072c64