Silicon Nanowires: Preparation, Device Fabrication, and Transport Properties
By Jae-Young Yu, †. A. S. Chung, J. Heath. 2000
212 citations recorded by the source corpus.
Subfields: Atomic and Molecular Physics, and Optics, Biomedical Engineering, Electrical and Electronic Engineering
View Paper: https://www.semanticscholar.org/paper/72b7cce0db0acda0454f55e8082d5e3eb94a5665
How researchers see this paper
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In Atomic and Molecular Physics, and Optics
In Biomedical Engineering
- E. Warren
- Nathan S. Lewis
- Harry A. Atwater
- S. Boettcher
- R. Briggs
- D. Turner-Evans
- M. C. Putnam
- Joshua M. Spurgeon
In Electrical and Electronic Engineering
- Nathan S. Lewis
- E. Warren
- S. Boettcher
- Harry A. Atwater
- R. Briggs
- D. Turner-Evans
- M. C. Putnam
- Joshua M. Spurgeon
Citations in the corpus
- Si microwire-array solar cells (2010, methodology): “Thermal diffusion doping, in-situ doping, and ion-implantation have been used to dope Si wires.[22, 46, 47] In particular, in-situ doping has been studied using p-type (trimethylboron and diborane) and n-type (phosphine) dopants in Si wires grown using SiH4.”
- Electrical transport along bacterial nanowires from Shewanella oneidensis MR-1 (2010, background): “The resistivity estimated from this measurement is 1 Ω·cm (Materials and Methods), comparable in magnitude to that of moderately doped silicon nanowires (11).”