Spectroscopic ellipsometry characterization of high-k dielectric HfO2 thin films and the high-temperature annealing effects on their optical properties

By Y. Cho, N. Nguyen, C. Richter, J. Ehrstein, B. Lee, Jack C. Lee. 2002

158 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials

View Paper: https://www.semanticscholar.org/paper/6d9e79e45333a3a30edc14e3eabd343db4fc7c61