Infrared spectroscopy study of low-dielectric-constant fluorine-incorporated and carbon-incorporated silicon oxide films

By Yoon-hae Kim, M. S. Hwang, H. Kim, J. Y. Kim, Y. H. Lee. 2001

169 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials

View Paper: https://www.semanticscholar.org/paper/67ef8a0f4e3a9a2e6b2b404e696026c86f3bb814