Mechanism of polishing of SiO2 films by CeO2 particles

By T. Hoshino, Kurata Yasushi, Yuuki Terasaki, K. Susa. 2001

278 citations recorded by the source corpus.

Subfields: Biomedical Engineering, Computational Mechanics, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/66c48edd28c80b4a7afda63aefc1913a2ccf8f40